Workshop

Preceding the technical program of the conference, a workshop entitled “ALD from basics to future perspectives” will take place on Sunday afternoon, June 29. The workshop program includes basics/fundamentals of ALD but also current issues/controversies and future new directions. This workshop is intended both for newcomers to the field of ALD but also for people that have been active within the field for years. The workshop will be given by eminent speakers that have contributed greatly to the development, understanding, and application of the ALD technique.

 

Preliminary workshop program (Sunday 29 June):

11:00 – 12:00

Workshop bruncheon

12:00

Workshop opening

12:00 – 12:45

Steven George (Univ. of Colorado, U.S.A.)
Surface Chemistry for ALD and MLD: Current understanding and future prospects

13:00 – 13:45

Mikko Ritala (Univ. of Helsinki, Finland)
ALD precursors: The current state and future needs

14:00 – 14:45

Roy Gordon (Harvard Univ., U.S.A.)
Step Coverage by ALD Films: Theory and examples of ideal and non-ideal reactions

15:00 – 15:30

Coffee break

15:30 – 16:15

Marc Heyns (IMEC, Belgium)
ALD for highly scaled CMOS and beyond

16:30 – 17:15

Jeff Elam (Argonne National Lab, U.S.A.)
New applications for ALD in energy technologies

17:30

Workshop closure

18:00 – 21:00

Welcome reception (complimentary to all ALD 2008 participants)

 

Participation in the workshop is limited by space and is available against an additional small fee of 30 Euros for students and 60 Euros for regular attendees (conference registration fee does not include participation in the workshop). Registration for the workshop takes place via the ALD 2008 conference registration.