List of invited
speakers
Thomas Mosbach- Universitaet Essen-Germany
VUV laser spectroscopy of high vibrational and rotational H2-states
Vincenzo Palleschi-Institute of Atomic and
Molecular Physics, CNR Pisa-Italy
A new self calibrated method for precise quantitative analysis by laser induced
breakdown spectroscopy
Andrew Orr-Ewing- University of Bristol- Great
Brittain
Pulsed and continuous wave cavity ring-down spectroscopy probes of chemical
vapour deposition plasmas
David Vender - Dublin City University - Ireland
Measuring current, voltage and impedance in rf plasmas
E. Kindel - INP Greifswald - Germany
The hook method - Interferometric diagnostics of gas discharges
Jean-Michel Pouvesle - Universite Orleans - France
X and XUV radiations: generation and applications opportunities for diagnostics
Laurent Vallier - CNRS/LETI, Grenoble - France
Chemical topography analysis using XPS during plasma etching in Si processing
H. ter Meulen-Katholieke Universiteit Nijmegen
- The Netherlands
Laser diagnostics in a diamond depositing oxy-acetylene flame
Eddie van Veldhuizen-Eindhoven University of
Technology- The Netherlands
Corona discharges: fundamentals and diagnostics