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Nanomanufacturing: ALD4PV

 

logoAtomic layer deposition (ALD) is a vapor-phase deposition technique that can be used to tailor interface properties by depositing high-quality thin films with precise growth control, very good uniformity over large areas, and excellent step coverage on non-planar surfaces at relatively low temperatures. These unique features make ALD very attractive for many solar cell designs that require (ultra)thin layers. PV applications of ALD include absorber films, buffer layers, interface layers, transparent contacts, photoanodes, encapsulation layers and surface passivation films. From the manufacturing point of view, ALD is on the verge of being introduced in the PV industry and it is expected that it will be part of the standard solar cell manufacturing equipment in the near future.

The relevance and potential of ALD for crystalline silicon (c-Si) solar cells, copper indium gallium selenide (CIGS) solar cells, dye-sensitized solar cells (DSC) and other emerging solar cell concepts will be addressed during the workshop. Furthermore, advances made in the upscaling of the ALD technology for the PV industry will be discussed.

The workshop is organized in the framework of the ALD4PV project funded by the EU through a Marie Curie IEF program. In this project, which has recently ended, the potential of ALD for various solar cell technologies has been investigated and highlighted. The project included research on silicon heterojunction solar cells (link), dye sensitized solar cells (link), and transparent conductive oxides.

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Confirmed speakers and program

ALD for crystalline silicon solar cells and heterojunctions

ALD for CIGS solar cells

ALD for DSC solar cells and beyond

Upscaling of ALD

An overview of the program can be found here. A compact printable version of the program can be found here.

Partners and Sponsors

The workshop is co-organized by

The workshop is sponsored by

Organizing Committee

Practical information

Registration

The workshop is free of charge but registration is required. Please note that the registration is in first come first served basis. Registration includes coffee/tea, lunch (standard or vegetarian) and drinks afterwards.

The deadline for registration is March 1. Click here to register.

Venue

Grand Café "Zwarte Doos" at TU/e

venue

The Zwarte Doos building can be found within walking distance of the Central Station, right at the beginning of the TU/e campus, just before the Vertigo building with the TU/e logo on the roof. For more info: Web page Zwarte Doos

Internet access

Wi-Fi will be available at the venue, but prior registration for access is necessary. The instructions to register for internet access will be sent to the participants with the email confirming the registration.

Travel

By train: When you have reached Eindhoven Central Station, you should take the exit to the bus station on the north side. Turn right as you leave the building and take the footpath between the office buildings until you reach the traffic lights. Cross over at the traffic lights, follow the footpath. After you have gone over the river Dommel, the Zwarte Doos is on your right hand side.

By car: From all the motorways to and around Eindhoven (A2, A50, A58, A67 and A270), first follow the signs for ‘Centrum’ and then for ‘Universiteit’. You can park your car on the campus where car parking is indicated. It is possible to park the car at TU/e campus (maximum parking fee for a day is € 7.50).

By plane: If you live in Europe, you can in many cases take a direct flight to Eindhoven Airport. From the airport a direct bus service operates to Eindhoven Central Station. If you can’t fly directly to Eindhoven Airport, you can fly to Amsterdam Airport Schiphol. From there you can reach Eindhoven Central Station by train in about an hour and a half.